Please use this identifier to cite or link to this item: http://bura.brunel.ac.uk/handle/2438/30187
Title: Si segregation deters prenucleation at the interfaces between liquid-aluminum and TiB2 substrates, the origin of ‘Si poisoning’
Authors: Fang, C
Wang, Y
Fan, Z
Keywords: Si poisoning;Al-Ti-B grain refinement;L-Al/TiB2 interface;prenucleation;Ab initio molecular dynamics
Issue Date: 4-Nov-2024
Publisher: Elsevier
Citation: Fang, C., Wang, Y. and Fan, Z. (2025) 'Si segregation deters prenucleation at the interfaces between liquid-aluminum and TiB2 substrates, the origin of ‘Si poisoning’', Scripta Materialia, 256, 116445, pp. 1 - 5. doi: 10.1016/j.scriptamat.2024.116445.
Abstract: The mechanism of ‘Si poisoning’ of Al-Ti-B based grain-refiners in Al-Si alloys has been a topic of intensive study for over half a century. We here investigate prenucleation of Al at the Si segregated interfaces between liquid Al and TiB2{0001} substrates using ab initio techniques. Our study reveals that chemical affinity between Ti and Si atoms empowers Si segregation at the Al(l)/substrate interface during solidification. The Si interfacial segregation curbs atomic ordering in the liquid Al adjacent to the substrate. Consequently, prenucleation of Al atoms at the Al(l)/{0001}TiB2 interface is deteriorated and thus, the subsequent nucleation process adversely affected, which causes the so-called ‘Si poisoning’ effect during the practice of grain refinement via inoculation with addition of TiB2 particles in Al-Si alloys.
Description: Supplementary materials are available online at: https://www.sciencedirect.com/science/article/pii/S1359646224004809#sec0002 .
URI: https://bura.brunel.ac.uk/handle/2438/30187
DOI: https://doi.org/10.1016/j.scriptamat.2024.116445
ISSN: 1359-6462
Other Identifiers: ORCiD: Changming Fang https://orcid.org/0000-0003-0915-7453
ORCiD: Yun Wang https://orcid.org/0000-0003-2367-7666
ORCiD: Zhongyun Fan https://orcid.org/0000-0003-4079-7336
116445
Appears in Collections:Brunel Centre for Advanced Solidification Technology (BCAST)

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