Please use this identifier to cite or link to this item: http://bura.brunel.ac.uk/handle/2438/25107
Full metadata record
DC FieldValueLanguage
dc.contributor.authorFang, PX-
dc.contributor.authorNihtianov, S-
dc.contributor.authorSberna, P-
dc.contributor.authorde Wijs, GA-
dc.contributor.authorFang, C-
dc.date.accessioned2022-08-22T10:36:39Z-
dc.date.available2022-08-22T10:36:39Z-
dc.date.issued2022-08-22-
dc.identifier.citationFang, P.X. et al. (2022) ‘Interfacial charge transfer and Schottky barriers at c-Si/a-In heterojunctions’, Journal of Physics Communications. IOP Publishing. pp 1- 12. doi:10.1088/2399-6528/ac8854.en_US
dc.identifier.issn2399-6528-
dc.identifier.urihttp://bura.brunel.ac.uk/handle/2438/25107-
dc.description.abstractMetal-Semiconductor (M/S) heterojunctions, better known as Schottky junctions play a crucial role in modern electronics. At present, the mechanisms behind the M/S junctions are still a subject of discussion. In this work, we investigate the interfaces between semiconducting crystalline Si and amorphous metallic indium, Si{0 0 1}/a-In and Si{1 1 1}/a-In using both ab initio molecular dynamics simulations and a Schottky-Mott approach. The simulations reveal the formation of a distinct border between the Si substrates and amorphous In at the interfaces. The In atoms adjacent to the interfaces exhibit atomic ordering. Charge transfer occurs from In to Si, forming c-Si−q/a-In+q charge barriers at the interfaces. This indicates that a crystalline p-Si/a-In heterojunction will have rectifying properties, which agrees with an analysis using the Schottky-Mott model which predicts a Schottky barrier height of 1.3 eV for crystalline p-Si/a-In using the calculated work function for a-In (3.82 eV). We further discuss the interfacial charge transfer, related hole-depletion regions in Si adjacent to the interfaces and the Schottky-Mott approximations.en_US
dc.publisherIOP Publishingen_US
dc.rights© 2022 The Author(s). Published by IOP Publishing Ltd-
dc.rights.urihttp://creativecommons.org/licenses/by/4.0-
dc.subjectSchottky heterojunctionen_US
dc.subjectinterface interactionen_US
dc.subjectab initio molecular dynamics simulationsen_US
dc.subjectcrystalline-Si/amorphous-Inen_US
dc.titleInterfacial charge transfer and Schottky barriers at c-Si/a-In heterojunctionsen_US
dc.typeArticleen_US
dc.identifier.doihttp://dx.doi.org/10.1088/2399-6528/ac8854-
dc.relation.isPartOfJournal of Physics Communications-
pubs.publication-statusPublished online-
dc.identifier.eissn2399-6528-
dc.rights.licenseOriginal content from this work may be used under the terms of the Creative Commons Attribution 4.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.-
Appears in Collections:Brunel Centre for Advanced Solidification Technology (BCAST)

Files in This Item:
File Description SizeFormat 
FullText.pdf1.64 MBAdobe PDFView/Open


This item is licensed under a Creative Commons License Creative Commons