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http://bura.brunel.ac.uk/handle/2438/22293
Title: | Interfaces between crystalline Si and amorphous B: Interfacial interactions and charge barriers |
Authors: | Fang, PX Nihtianov, S Sberna, P Fang, C |
Issue Date: | 9-Feb-2021 |
Publisher: | American Physical Society |
Citation: | Fang, P.X. et la..(2021) 'Interfaces between crystalline Si and amorphous B: Interfacial interactions and charge barriers', Physical Review B., 103 (7), 075301, pp. 1-x. doi: 10.1103/PhysRevB.103.075301. |
Abstract: | The recently found crystalline Silicon-amorphous Boron (c-Si/a-B) heterojunction has been successfully applied in the detection of short-wave UV photons. These detectors play a decisive role in the progress of nanoelectronics fabrication. The c-Si/a-B heterojunction could not be explained using the existing `instrumentarium' in semiconductor physics. We investigated the c-Si/a-B interfaces using ab initio molecular dynamics simulations. The simulations reveal atomic ordering of the a-B atoms adjacent to both the Sif0 0 1g and Sif1 1 1g substrates. Charge transfer occurs from the interfacial Si to B, thereby forming Si+/B- charge barriers, which induce an electric eld in the nearby regions. The obtained information here is helpful in furthering our understanding of the physics behind the c-Si/a-B junctions, as well as driving the development of a new `instrumentatrium' in solid state physics. |
URI: | https://bura.brunel.ac.uk/handle/2438/22293 |
DOI: | https://doi.org/10.1103/PhysRevB.103.075301 |
ISSN: | 1098-0121 |
Other Identifiers: | ORCID iD: Chngming Fang https://orcid.org/0000-0003-0915-7453 075301 |
Appears in Collections: | Brunel Centre for Advanced Solidification Technology (BCAST) |
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FullText.pdf | Copyright © 2021 American Physical Society. All rights reserved (see https://journals.aps.org/copyrightFAQ.html#post). | 2.41 MB | Adobe PDF | View/Open |
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